Search results for "C [PolyI]"
showing 10 items of 30703 documents
First experiments on applying the gasdynamic ECR ion source for negative hydrogen ion production
2017
This article has no abstract. peerReviewed
Determination of Core Size Dependency on the EMI Suppression in Cable Ferrites
2020
Electromagnetic Compatibility (EMC) engineering should be approached via the systems approach, considering EMC throughout the design to anticipate possible electromagnetic interferences (EMI) problems. Nevertheless, an EMI source may appear when the designed device is supplied via an external power system or it is connected to another device to communicate to it. In these both cases, the cables or interfaces that interconnect the systems could represent the EMI source. Thereby, one of the most common techniques for reducing EMI in cables is the application of an EMI suppressor such as sleeve ferrite cores to them. The advantage of this solution is that it does not involve redesign the elect…
The helicoidal magnetic generator
2016
Recently helicoidal generator for the exploitation of sea wave energy has been proposed. This device can convert both the vertical and rotational movement of seawaves. The electrical energy generated by such a device must be converted and conditioned in order to match the instantaneous utility requirements and a power link from the sea to an interconnection is needed. In this paper, the authors propose a mathematical model of this device and preliminarily present a prototype of the machine.
Injected 1+ ion beam as a diagnostics tool of charge breeder ECR ion source plasmas
2015
International audience; Charge breeder electron cyclotron resonance ion sources (CB-ECRIS) are used as 1+ →n+ charge multiplication devices of post-accelerated radioactive ion beams. The charge breeding process involves thermalization of the injected 1+ ions with the plasma ions in ion–ion collisions, subsequent ionization by electron impact and extraction of the n+ ions. Charge breeding experiments of 85Rb and 133Cs ion beams with the 14.5 GHz PHOENIX CB-ECRIS operating with oxygen gas demonstrate the plasma diagnostics capabilities of the 1+ injection method. Two populations can be distinguished in the m/q-spectrum of the extracted ion beams, the low (1+ and 2+) charge states repres…
Silicon Surface Passivation by ALD-Ga2O3: Thermal vs. Plasma-Enhanced Atomic Layer Deposition
2020
Silicon surface passivation by gallium oxide (Ga2O3) thin films deposited by thermal- and plasma-enhanced atomic layer deposition (ALD) over a broad temperature range from 75 °C to 350 °C is investigated. In addition, the role of oxidant (O3 or O-plasma) pulse lengths insufficient for saturated ALD-growth is studied. The material properties are analyzed including the quantification of the incorporated hydrogen. We find that oxidant dose pulses insufficient for saturation provide for both ALD methods generally better surface passivation. Furthermore, different Si surface pretreatments are compared (HF-last, chemically grown oxide, and thermal tunnel oxide). In contrast to previous reports, t…
Atomic Layer Deposition and Properties of Lanthanum Oxide and Lanthanum-Aluminum Oxide Films
2006
Atomic layer deposition (ALD) of lanthanum oxide on glass and silicon substrates was examined using lanthanum silylamide, La[N(SiMe 3 ) 2 ] 3 , and water as precursors in the substrate temperature range of 150-250 °C. The effect of pulse times and precursor evaporation temperature on the growth rate and refractive index was investigated. The films remained amorphous regardless of the deposition conditions. The resulting La 2 O 3 films contained noticeable amounts of hydrogen and silicon and were chemically unstable while stored in ambient air. Lanthanum aluminum oxide films were achieved with stoichiometry close to that of LaAlO 3 at 225°C from La[N(SiMe 3 ) 2 ] 3 , Al(CH 3 ) 3 , and H 2 O.…
MeV-energy Xe ion-induced damage in LiF: The contribution of electronic and nuclear stopping mechanisms
2016
The contribution of electronic and nuclear damage mechanisms in the modification of structure and micromechanical properties of LiF crystals irradiated with 52, 224, and 450 MeV Xe ions at fluences 1010–1014 ions cm−2 has been studied. The ion-induced formation of dislocations and hardening in LiF at fluences above 1010 ions cm−2 has been observed. The depth profiles of nanoindentation show a joint contribution of electronic excitation and nuclear (impact) mechanisms to the ion-induced hardening. The electronic excitation mechanism dominates in the major part of the ion range while the impact mechanism prevails in a narrow zone at the end of the ion range. The efficiency of hardening produc…
Space charge accumulation in undersea HVDC cables as function of heat exchange conditions at the boundaries – water-air interface
2020
Transmission lines with undersea HVDC cables are an interesting technological solution for the supply of electrical energy to islands. The accumulation of space charge inside the dielectric layer of a HVDC cable is one of the most important element to consider in its design and during operation. The formation of space charge is due to various factors including the high dependence on the temperature of the electrical conductivity of the insulation and the establishment of a thermal gradient under load conditions. This research is focused on the space charge accumulation phenomenon around a section of a HVDC cable half dipped in water and half in air. Due to the high difference in thermal con…
The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
2017
Two distinguishable plasma modes in the O2–N2 radio frequency capacitively coupled plasma (CCP) used in remote plasma-enhanced atomic layer deposition (PEALD) were observed. Optical emission spectroscopy and spectra interpretation with rate coefficient analysis of the relevant processes were used to connect the detected modes to the α and γ modes of the CCP discharge. To investigate the effect of the plasma modes on the PEALD film growth, ZnO and TiO2 films were deposited using both modes and compared to the films deposited using direct plasma. The growth rate, thickness uniformity, elemental composition, and crystallinity of the films were found to correlate with the deposition mode. In re…
Structural and morphological characterization of the Cd-rich region in Cd1-xZnxO thin films grown by atmospheric pressure metal organic chemical vapo…
2019
Abstract We have analysed the growth, morphological and structural characterization of Cd1-xZnxO thin films grown on r-sapphire substrates by atmospheric pressure metal organic chemical vapour deposition, mainly focusing on the Cd-rich rock-salt phase for its promising optical and technological applications. The evolution of the surface morphology and crystalline properties as a function of Zn content has been studied by means of high resolution x-ray diffraction and electron microscopy techniques. Monocrystalline (002) single-phase cubic films were obtained with Zn contents up to 10.4%, and with a low density of dislocations as a consequence of the optimized crystal growth process. Particu…